(Solved): 9. \( A \) silicon wafer has a \( 1000-\AA \) oxide on its surface in some area as shown in the fi ...

9. \( A<100> \) silicon wafer has a \( 1000-\AA \) oxide on its surface in some area as shown in the figure on the right. Dry oxidation was done on this wafer at \( 1100^{\circ} \mathrm{C} \) for \( 2.0 \mathrm{hr} \). Calculate the final oxide thickness in the field and window regions. Draw the cross-section profile of the wafer after the additional oxidation (17 pts)